Welcome to the Lyman Group
Our research group focuses on structural issues of surface and thin film
systems. Principal interests include semiconductor surface structure
and thin film growth mechanisms. Our interest in Group IV semiconductor
heterosystems is driven by potential electronic applications that can be
inexpensively integrated with the dominant material, silicon.
Growth is presently carried out by simple molecular
beam epitaxy (MBE). Gas-source MBE capabilities are being added.
To determine structure, we use x-ray standing waves, x-ray photoemission,
x-ray diffraction, and electron diffraction (LEED and soon RHEED).